Zone-plate-array Lithography (zpal)
نویسندگان
چکیده
Nanolithography is the key technology driving technological progress in electronics, photonics, information technology and biotechnology. The tools and techniques used in the semiconductor industry have become too expensive for applications other than high-volume manufacturing. Masks, which are required for each unique design, can cost tens of thousands of dollars per layer. This economic constraint has made nano-patterning accessible to a select few, namely the major companies of the semiconductor industry, who can absorb these costs with high-volume production. Empowering the next generation of innovators will require making available an inexpensive, yet highly capable optical nanolithography tool.
منابع مشابه
Zone-Plate-Array Lithography (ZPAL): Optical Maskless Lithography for Cost-Effective Patterning
Zone-Plate-Array Lithography (ZPAL) is an optical-maskless-lithography technique, in which an array of tightly focused spots is formed on the surface of a substrate by means of an array of high-numerical-aperture zone plates. The substrate is scanned while an upstream spatial-light modulator, enabling “dot-matrix” style writing, modulates the light intensity in each spot. We have built a proof-...
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We present a simulation study which examines the use of zone plates for lithography. Zone-Plate-Array Lithography (ZPAL) is a maskless lithography scheme that uses an array of shuttered zone plates to print arbitrary patterns in resist on a substrate. We have demonstrated a working ZPAL system in the UV regime, and are pursuing further experiments with the 4.5 nm X-ray to obtain smaller feature...
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As lithography quickly approaches its limits with current technologies, a host of new ideas is being proposed in hopes of pushing lithography to new levels of performance. The work presented in this thesis explores the use of an immersion scheme to improve the performance of a maskless lithographic technique known as Zone-Plate-Array Lithography (ZPAL). This is believed to be the first implemen...
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Earlier we reported on a proof-of-concept maskless-lithography system that used an array of Fresnel zone plates to focus multiple beams of 442 nm light onto a substrate, and micromechanics for multiplexing light to the several zone plates, enabling patterns of arbitrary geometry, at 350 nm linewidth, to be written. We referred to the technique as zone-plate-array lithography ~ZPAL!. We also dem...
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In semiconductor lithography, glass masks are illuminated with deep UV laser light and their image is reduced through a lens onto the substrate to define circuitry. As feature sizes are pushed towards 100 nm and smaller, lithography systems and masks are becoming increasingly complex and costly (~$1 million per mask set). In addition, the delay in obtaining a mask set, with complex optical-prox...
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